Full Automatic Projection / Proximity Exposure Equipment for Wafer

 

[Overview]
1x magnification projection exposure system equipped with original high NA projection optics.
It can also be used for thick film resists.
We can propose transfer system depending on the application such as Wafer and FPC

[Use]
MEMS LED Crystal FPC, etc.

[Specification]
Up to 6 inches
Alignment accuracy ± 1 μm
* Backside alignment is available as an option.