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  +603-76136915   P1-30 Lumi Tropicana, Persiaran Tropicana, 47800

Vertical Glass Exposure system / Horizontal Glass Exposure system


This equipment has a original UV optical system optimized for high-definition exposure and a mechanism for parallelizing the photomask and wafer with high precision.
Fully automatic exposure equipment that supports vacuum contact, soft contact, and proximity gap.
* Vertical type is proposed for large size masks of G5 and above.
* Horizontal type is proposed for masks of G4.5 or less.
The overall CF TP FPD
Available Substrate Size:G4.5-G8.5
Substrate Size :G4.5-G8.5
Alignment Accuracy :±1μm
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