Vertical Glass Exposure system / Horizontal Glass Exposure system

 

[Overview]
This equipment has a original UV optical system optimized for high-definition exposure and a mechanism for parallelizing the photomask and wafer with high precision.
Fully automatic exposure equipment that supports vacuum contact, soft contact, and proximity gap.
* Vertical type is proposed for large size masks of G5 and above.
* Horizontal type is proposed for masks of G4.5 or less.

[Use]
The overall CF TP FPD

[Specification]
Available Substrate Size：G4.5-G8.5
Substrate Size :G4.5-G8.5
Alignment Accuracy :±1μm